The Invisible Opponent of Laser Processing: A Complete Guide To Thermal Effect Control This article provides a comprehensive technical guide on managing and minimizing thermal effects in laser processing. It explains core concepts such as the Heat Affected Zone (HAZ), thermal relaxation time, and absorption rates. By identifying heat sources across three levels—source-level (wavelength mismatch), process-level (pulse accumulation), and path-level (scanning patterns)—it offers systematic solutions including optimizing optical configurations, selecting "colder" light sources (e.g., UV or ultrashort pulse lasers), and adjusting process logic through multi-pass strategies and auxiliary gases. Detailed parameter tables for various materials and a troubleshooting guide are included to help engineers achieve high-precision results with minimal thermal damage.